Effect of LEO atomic oxygen on the optical properties and laser damage resistance of r.f. sputtered silica, niobia and tantala thin films

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This study evaluates the degradation of SiO2, Nb2O5, and Ta2O5 thin films when exposed to atomic oxygen simulating low-Earth orbit conditions. Results indicate that while niobia films maintain performance, silica and tantala coatings suffer from reduced optical transmittance and laser damage resistance. The findings provide insight into the interaction mechanisms between thin-film interference materials and the corrosive atomic oxygen environment.