Simulation-based Optimization of Detector Layer Thickness to Reduce Contamination-Induced Etaloning

In 30 seconds

This study employs simulation-based optimization of detector layer thickness to minimize contamination-induced etaloning in hyperspectral imaging sensors. By precisely tuning the multilayer structure, the design reduces the sensitivity of interference fringes to thin-film surface deposition, such as water ice. This approach enhances the long-term stability of instrument calibration, reducing the frequency of mission-disrupting thermal annealing cycles and lowering overall operational complexity.